publication venue for
- Auger and x‐ray characterization of surface nitride films on Ti, Zr, and Hf. 21:36-41. 1982
- The preparation and characterization of transition metal nitride films. 20:966-967. 1982
- AUGER AND X-RAY CHARACTERIZATION OF SURFACE NITRIDE FILMS ON TI, ZR, AND HF.. V 21:36-41. 1982
- Preferential sputtering and surface segregation in tungsten–molybdenum alloys. 18:529-532. 1981
- Radiation effects in MOS devices caused by x-ray and e-beam lithography. 16:1658-1661. 1979