The preparation and characterization of transition metal nitride films Journal Articles uri icon

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abstract

  • Nitride surface films of Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, and W have been prepared by reaction with NH3 gas at high temperature. The films have been characterized by x-ray diffraction, Auger electron spectroscopy, depth profiling, and scanning electron microscopy.

publication date

  • April 1, 1982