Journal article
The preparation and characterization of transition metal nitride films
Abstract
Nitride surface films of Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, and W have been prepared by reaction with NH3 gas at high temperature. The films have been characterized by x-ray diffraction, Auger electron spectroscopy, depth profiling, and scanning electron microscopy.
Authors
Dawson PT; Stazyk SAJ
Journal
Journal of Vacuum Science and Technology, Vol. 20, No. 4, pp. 966–967
Publisher
American Vacuum Society
Publication Date
April 1, 1982
DOI
10.1116/1.571654
ISSN
0022-5355