Journal article
Mechanical and Optical Properties of Amorphous SiN-Based Films Prepared By ECR PECVD and CCP PECVD
Abstract
Hydrogenated amorphous silicon nitride (a-SiN:H) and silicon carbonitride (a-SiCN:H) films grown by plasma enhanced chemical vapor deposition (PECVD) are widely investigated for their interesting optical and electrical properties [1]. In this work, we discuss the effect of the deposition power on SiN-based films during plasma deposition. The influence on the optical and mechanical properties of the films was investigated. In order to study this …
Authors
Ahammou B; Abdelal A; Levallois C; Landesman J-P; Mascher P
Journal
ECS Meeting Abstracts, Vol. MA2021-01, No. 21, pp. 858–858
Publisher
The Electrochemical Society
Publication Date
May 30, 2021
DOI
10.1149/ma2021-0121858mtgabs
ISSN
2151-2043