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Substitutional doping during low-dose implantation of Bi and Ti ions in Si at 25°C
Journal Articles
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Additional Document Info
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Overview
authors
Eriksson, L
Bellavance, GR
Davies, John Arthur
status
published
publication date
January 1969
published in
Radiation Effects
Journal
Research
keywords
51 Physical Sciences
5104 Condensed Matter Physics
Identity
Digital Object Identifier (DOI)
10.1080/00337576908234463
Additional Document Info
start page
71
end page
73
volume
1
issue
1