Journal article
A New Non-PRM Bumping Process by Electroplating on Si Die for Three Dimensional Packaging
Abstract
A new bumping process on a Si die by electroplating without a photo-resist-mold (PRM) was assessed for the three dimensional (3D) stacking of Si dice. In this process, solder bumps were deposited selectively onto the surface of a Cu plugged-through silicon-via (TSV) in a Si die. Since lithography related processes to make a PRM for solder bumping were omitted, it can reduce the production time and cost for bumping. The substrate was a Si wafer, …
Authors
Jun J; Kim I; Mayer M; Zhou YN; Jung S; Jung J
Journal
Materials Transactions, Vol. 51, No. 10,
Publisher
Japan Institute of Metals
Publication Date
2010
DOI
10.2320/matertrans.m2009314
ISSN
0916-1821