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Laser-induced explosive boiling during nanosecond...
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Laser-induced explosive boiling during nanosecond laser ablation of silicon

Abstract

The surface morphology of single crystal (100) Si wafers irradiated by 266 and 1064nm laser pulses emitted by a Nd:YAG laser has been investigated. The morphology of the bottom of craters formed as a result of single or multipulse laser irradiation by the 266nm wavelength, which is well absorbed by Si (optical absorption coefficient, α ∼106cm−1), remained flat and almost featureless up to the maximum fluence of 18J/cm2 used in this study. The …

Authors

Craciun V; Bassim N; Singh RK; Craciun D; Hermann J; Boulmer-Leborgne C

Volume

186

Pagination

pp. 288-292

Publisher

Elsevier

Publication Date

January 2002

DOI

10.1016/s0169-4332(01)00766-8

Conference proceedings

Applied Surface Science

Issue

1-4

ISSN

0169-4332