Advances in etching of 2D nanomaterials: Research challenges and advanced devices

Etching is central to the processing of two-dimensional (2D) materials, providing atomic-level precision needed to tailor their structural, electronic, and optical properties. Despite advances in plasma, chemical, and atomic layer etching, major challenges remain in achieving reliable depth control, defect management, and anisotropy at scales compatible with industrial manufacturing. The intrinsic sensitivity of 2D materials to processing …