Conference
Monolithic silicon avalanche photodetector utilizing surface state defects operating at 1550 nm
Abstract
In this work, we report on all-silicon waveguide photodetectors utilizing surface state defects and bulk defects to sensitize the silicon to sub-bandgap light. The detectors are foundry fabricated, waveguide-integrated p-i-n junctions with post-processing consisting of HF acid exposure, ion implantation, annealing, or a combination of the three. HF exposure increases the photoresponse of the as-received detectors due to the increase in …
Authors
Gao Y; Guo F; Mascher P; Knights AP
Volume
12426
Publisher
SPIE, the international society for optics and photonics
DOI
10.1117/12.2651724
Name of conference
Silicon Photonics XVIII
Conference proceedings
Proceedings of SPIE--the International Society for Optical Engineering
ISSN
0277-786X