Conference
TruNano™ processing of color photoresist for the flexible LCD module
Abstract
We present a low temperature thermal process for the color photoresist on the flexible substrate for the LCD color filter module by the TruNano™ processor in combination with a compositional modification to the conventional color photoresist. By this method the curing temperature can be lowered by more than 100°C, and the curing process time also can be shortening by more than 20 min.
Authors
Lee MMS; Moon BC; Bae BS; Kim WY; Kim NH; Cheon CII; Kim JS
Volume
2006
Pagination
pp. 443-444
Publication Date
December 1, 2006
Conference proceedings
Proceedings of International Meeting on Information Display
ISSN
1738-7558