Temperature-insensitive echelle wavelength demultiplexer on standard silicon-on-insulator platform

Temperature sensitivity is an issue that severely affects many integrated silicon photonic devices. Proper circuit functionality is normally ensured by active thermal control at the expense of energy consumption. In some cases, athermal behavior can be achieved exploiting cladding materials with a negative thermo-optic coefficient to counterbalance the positive coefficients of silicon and silica. On the other hand, in echelle grating filters this method is not effective because in the slab free-propagation region the modal overlap with the cladding is small, especially for TEpolarized light. Moreover the need to add non-standard materials to the established silicon-on-insulator (SOI) fabrication process could make these solutions impractical. Here we present the design of a temperature-insensitive echelle grating demultiplexer with four channels operating in the TE polarization that does not use any materials with negative thermooptic coefficient and relies exclusively on standard processes for SOI photonics. The design exploits a temperaturesynchronized Mach-Zehnder interferometer as input to the echelle to compensate the shift of the imaged field with temperature. The device achieves a significant reduction in the temperature dependence of the overall transmission with a residual channel wavelength fluctuation smaller than 45 pm over a temperature range of 20 K, compared to a 1.6-nm shift for the same grating with a conventional waveguide input. The excess loss due to the use of the Mach-Zehnder input is no more than 0.7 dB for all four channels. Furthermore, the proposed design shows a very good tolerance to fabrication uncertainty, with minimum degradation of the performance for waveguide width variations of 10 nm.