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Surface Activated Bonding of 8 in. Si Wafers for...
Conference

Surface Activated Bonding of 8 in. Si Wafers for MEMS and Microfluidic Packaging

Abstract

The challenges for direct wafer bonding using surface activated bonding (SAB) method have been investigated. For this purpose, 4–8 in. silicon wafers with and without fine patterns were bonded in vacuum. Three challenges are identified through comprehensive investigations of the bonded interfaces using infrared (IR) transmission, tensile pulling, and high-resolution transmission electron microscopy (HRTEM) observation. First is the alignment …

Authors

Howlader MMR; Suga T

Pagination

pp. 1423-1429

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Publication Date

May 1, 2009

DOI

10.1109/ectc.2009.5074198

Name of conference

2009 59th Electronic Components and Technology Conference

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