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Analysis of near-field holographic pattern...
Conference

Analysis of near-field holographic pattern formation using phase masks

Authors

Chen G; Jian S; Yang L; Li X; Ge H; Wang W

Volume

2885

Pagination

pp. 169-174

Publisher

SPIE, the international society for optics and photonics

Publication Date

September 23, 1996

DOI

10.1117/12.251862

Name of conference

Holographic Optical Elements and Displays

Conference proceedings

Proceedings of SPIE--the International Society for Optical Engineering

ISSN

0277-786X