Soft x-ray projection lithography

This article examines soft x-ray projection lithography (SXPL) as a potential late 1990's technology for the mass production of ICs with 0.1 μm features. Synchrotron radiation and laser generated plasma x-ray sources may both be suitable for volume production. Reflecting optics are required for projection lithography in the 13 to 16 nm range. Building a projection camera will require advances in mirror blank fabrication, multilayer film techniques for high reflectivity coatings, x-ray metrology, and alignment systems.