Conference
Electron Cyclotron Resonance CVD of Silicon Oxynitride for Optoelectronic Applications
Abstract
Silicon oxynitrides with compositions varying from Si2N4 to SiO2 were deposited on silicon substrates by electron cyclotron resonance plasma enhanced chemical vapour deposition (ECR-PECVD). The silicon source used is an organic liquid, Tris Dimethyl Amino Silane (trade name SiN − 1000™). Optical emission spectroscopy is used to characterize the ECR plasma, this information then is correlated with the optical properties of the deposited film, as …
Authors
Boudreau M; Boumerzoug M; Kruzelecky RV; Mascher P; Jessop PE; Thompson DA
Volume
300
Pagination
pp. 183-188
Publisher
Springer Nature
Publication Date
December 1993
DOI
10.1557/proc-300-183
Conference proceedings
MRS Advances
Issue
1
ISSN
2731-5894