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Monolithic silicon waveguide photodiode utilizing...
Journal article

Monolithic silicon waveguide photodiode utilizing surface-state absorption and operating at 10 Gb/s

Abstract

We have fabricated a waveguide integrated monolithic silicon infrared detector. The photodiode consists of a p-i-n junction across a silicon-on-insulator (SOI) rib waveguide. Absorption is due to surface-states at the silicon/air interface of the waveguide. A 2 mm long detector shows a response of 0.045 A/W (calculated as a function of coupled light) and is capable of operation at 10 Gb/s at a reverse bias voltage of 2 V.

Authors

Ackert JJ; Karar AS; Cartledge JC; Jessop PE; Knights AP

Journal

Optics Express, Vol. 22, No. 9, pp. 10710–10715

Publisher

Optica Publishing Group

Publication Date

May 5, 2014

DOI

10.1364/oe.22.010710

ISSN

1094-4087