authors Mastro, MA Holm, RT Bassim, Nabil Gaskill, DK Culbertson, JC Fatemi, M Eddy, CR Henry, RL Twigg, ME
keywords ALUMINUM NITRIDE GAN INTRINSIC STRESSES LAYERS MOCVD GROWTH Materials Science Materials Science, Coatings & Films Physical Sciences Physics Physics, Applied SI(111) SILICON STRESS MEASUREMENTS Science & Technology TEMPERATURE ALN INTERLAYERS THIN-FILMS Technology