Approaches to Reduced-Defect Active Regions for III-N Devices

Two approaches to achieving reduced-defect active regions in III-N devices are discussed - confined epitaxy and heteroepitaxy on step-free SiC surfaces. In confined epitaxy, sapphire substrates (either GaN coated or not) are patterned with a dielectric mask and then III-N device structures are selectively and vertically grown in the openings using metalorganic chemical vapor deposition (MOCVD). In heteroepitaxy on step-free SiC surfaces, SiC mesas are created that have surfaces completely free of atomic steps and then used as substrates for conventional MOCVD III-N growth. In both approaches significant reductions in extended defect densities (10-100x) are observed and manifest in improved electroluminescence efficiency of UV emitters and leakage currents in UV detectors. Extensions of these efforts and other structural characterization results will be presented. Modeling results suggesting directions for future efforts will also be discussed.

Approaches to Reduced-Defect Active Regions for III-N Devices Conferences