Conference
Test Structures for CD and Overlay Metrology on Alternating Aperture Phase-Shifting Masks
Abstract
The ability to test and characterise advanced photomasks for verification and process control is increasingly important and this paper builds on previous work in this area. Atomic force and scanning electron microscope measurements are used to explain anomalies in previously presented results. In addition, a new test structure has been developed to measure an important parameter in alternating aperture phase shifting masks; the alignment …
Authors
Smith S; McCallum M; Walton AJ; Stevenson JTM; Harris PD; Ross AWS; Hourd AC; Jiang L
Pagination
pp. 29-34
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Publication Date
January 1, 2004
DOI
10.1109/icmts.2004.1309296
Name of conference
Proceedings of the 2004 International Conference on Microelectronic Test Structures (IEEE Cat. No.04CH37516)