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(Invited) Growing Si Nanocrystals within a-Si...
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(Invited) Growing Si Nanocrystals within a-Si Nanoclusters Embedded in a-SiO2: Evolution of Photoluminescence

Abstract

We combine X-ray absorption, electron spin resonance and Raman spectroscopies, X-ray diffraction and photoluminescence (PL) techniques to determine the structure and luminescence mechanisms in Si nanoclusters (Si-ncls) embedded within Si oxides at various intermediate formation stages. The Si-ncls/oxide systems are fabricated by thermally annealing plasma-enhanced chemical vapor deposited Si-rich Si-oxide films. The structural and chemical orders in the amorphous oxide matrix, the Si-ncls amorphous and crystalline volume fractions and sizes, the dangling bond density and PL spectra and decay rates are followed closely as a function of the annealing temperature. The results can be interpreted by a crystalline core/amorphous shell model for the Si-ncls. The important role of the shell, often ignored in the literature, is discussed. As the Si-ncls crystalline cores grow at the expense of thinning amorphous shells, the PL undergoes a transition from a regime dominated by disorder-induced effects to a situation where quantum confinement prevails.

Authors

Borrero-González LJ; Nunes LAO; Guimarães FEG; Wojcik J; Mascher P; Gennaro AM; Tirado M; Comedi D

Volume

45

Pagination

pp. 11-19

Publisher

The Electrochemical Society

Publication Date

April 27, 2012

DOI

10.1149/1.3700405

Conference proceedings

ECS Transactions

Issue

5

ISSN

1938-5862
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