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Dependence of InGaP nanowire morphology and...
Journal article

Dependence of InGaP nanowire morphology and structure on molecular beam epitaxy growth conditions

Abstract

InGaP nanowires (NWs) were grown by the Au-assisted method in a gas source molecular beam epitaxy system. The dependence of InGaP composition, morphology and stacking fault density was studied with respect to group III and V impingement rate and size of the Au particle. Compositional analysis showed that the NWs had an In-rich core and a Ga-rich shell structure. The In incorporation within the NW became limited as the Au seed particle size diminished or the group III and V flux decreased. The NWs had wurtzite (WZ) crystal structure with zinc blende (ZB) segments (stacking faults). The density of the stacking faults decreased as the group III flux decreased and the group V flux increased.

Authors

Fakhr A; Haddara YM; LaPierre RR

Journal

Nanotechnology, Vol. 21, No. 16,

Publisher

IOP Publishing

Publication Date

April 23, 2010

DOI

10.1088/0957-4484/21/16/165601

ISSN

0957-4484

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