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Mechanisms of molecular beam epitaxy growth in...
Journal article

Mechanisms of molecular beam epitaxy growth in InAs/InP nanowire heterostructures

Abstract

InAs/InP axial nanowire heterostructures were grown by the Au-assisted vapour-liquid-solid method in a gas source molecular beam epitaxy system. The nanowire crystal structure and morphology were investigated by transmission electron microscopy for various growth conditions (temperature, growth rate, V/III flux ratio). Growth mechanisms were inferred from the InAs and InP segment lengths as a function of the nanowire diameter. Short InAs segment lengths were found to grow by depletion of In from the Au particle as well as by direct impingement, while longer segments of InAs and InP grew by diffusive transport of adatoms from the nanowire sidewalls. The present study offers a way to control the lengths of InAs quantum dots embedded in InP barriers.

Authors

Haapamaki CM; LaPierre RR

Journal

Nanotechnology, Vol. 22, No. 33,

Publisher

IOP Publishing

Publication Date

August 19, 2011

DOI

10.1088/0957-4484/22/33/335602

ISSN

0957-4484

Labels

Fields of Research (FoR)

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