Journal article
Fabrication of SiGe Optical Waveguides Using VLSI Processing Techniques
Abstract
The fabrication of rib waveguides in SiGe using the local oxidation of silicon (LOCOS) was investigated. Samples consisted of strained Si.97Ge.03or Si.94 Ge.06waveguiding layers with silicon cladding layers. The structural stability of these strained layers during thermal cycling up to 1050°C was examined using X-ray rocking curve analysis, scanning electron microscopy, and Nomarski microscopy of etched samples. Since single SiGe layers …
Authors
Pearson MRT; Jessop PE; Bruce DM; Wallace S; Mascher P; Ojha J
Journal
Journal of Lightwave Technology, Vol. 19, No. 3, pp. 363–370
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Publication Date
3 2001
DOI
10.1109/50.918889
ISSN
0733-8724