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Interface Structure of Ge/Si Superlattices...
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Interface Structure of Ge/Si Superlattices Determined by X-Ray Absorption Fine Structure

Abstract

We illustrate the usefulness of the Extended X-ray Absorption Fine Structure (EXAFS) technique to determine the amount of interface mixing and strain condition in the study of (SimGen)p short-period superlattices. It is found that for n < 4, the number of Ge and Si nearest neighbours to Ge atoms is consistent with ~25% interfacial mixing and that the Ge-Ge bond length corresponds to that of coherently strained Ge. The Si-Ge bond length is shorter, close to that of a strained Si0.25Ge0.75 alloy. For n > 4, the Ge-Ge bond length and the number of Si-Ge nearest neighbours increase significantly consistent with partial relaxation and interdiffusion. Raman scattering spectroscopy and x-ray reflectometry …

Authors

Aebi P; Tyliszczak T; Hitchcock AP; Baribeau J-M; Lockwood DJ; Jackman TE

Volume

220

Pagination

pp. 253-258

Publisher

Springer Nature

Publication Date

1991

DOI

10.1557/proc-220-253

Conference proceedings

MRS Advances

Issue

1

ISSN

2731-5894