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X-ray absorption of As low-energy ion implanted...
Conference

X-ray absorption of As low-energy ion implanted into Si(100) grown by molecular-beam epitaxy

Abstract

Information about the local environment of dopants in semiconductor materials is required to understand and help optimize the electrical activity in highly doped samples. The near-edge (XANES) and extended x-ray absorption fine structure (EXAFS) components of x-ray absorption spectra provide detailed information on local geometric and electronic structure about selected atoms. Electron yield and fluorescence detection of As K EXAFS and XANES, …

Authors

Tyliszczak T; Hitchcock AP; Jackman TE

Volume

8

Pagination

pp. 2020-2024

Publisher

American Vacuum Society

Publication Date

May 1, 1990

DOI

10.1116/1.576799

Conference proceedings

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Issue

3

ISSN

0734-2101