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Optical and Structural Properties of InAs Quantum...
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Optical and Structural Properties of InAs Quantum Dots Emitting Near 1.5 $\mu$m Grown on a GaAs substrate with an ${\rm In}_{{\rm x}}{\rm Ga}_{1-x}$As Metamorphic Buffer Layer

Abstract

The structural and optical properties of InAs quantum dots (QDs) grown on an ${\rm In}_{{\rm x}}{\rm Ga}_{1-{\rm x}}$ As metamorphic layer, with different x values, on GaAs substrates are presented. The results for various QD layer thicknesses and growth temperatures are reported. The density of the dots and their diameter increase as the In content in the metamorphic layer increases. For a layer of dots grown in a strained InGaAs quantum well, incorporated in a metamorphic layer with 30% In, room temperature photoluminescence emission at 1.57 $\mu$ m has been demonstrated.

Authors

Tavakoli SG; Hulko O; Thompson DA

Pagination

pp. 176-179

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Publication Date

December 1, 2006

DOI

10.1109/commad.2006.4429909

Name of conference

2006 Conference on Optoelectronic and Microelectronic Materials and Devices
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