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Photoreflectance study of changes in the QW...
Conference

Photoreflectance study of changes in the QW profile of 1.55-micrometer laser structure induced by SiO2 cap layers

Abstract

Quantum well (QW) band gap modification has been carried out in 1.55 μm InGaAsP-based laser structures using a silicon dioxide cap (SiO2) and rapid thermal annealing (RTA). Migration of the semiconductor atoms across the QW interface changes the profile of QW from a square well to a rounded well. The modification of the profile causes the shift of energy levels in the QW. In consequence, a blue shift of the emission peak is observed in …

Authors

Kudrawiec R; Sęk G; Rudno-Rudziński W; Misiewicz J; Wojcik J; Robinson BJ; Thompson DA; Mascher P

Volume

101

Pagination

pp. 232-235

Publisher

Elsevier

Publication Date

8 2003

DOI

10.1016/s0921-5107(02)00669-4

Conference proceedings

Materials Science and Engineering B

Issue

1-3

ISSN

0921-5107