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Effect of layer separation, InAs thickness, and...
Journal article

Effect of layer separation, InAs thickness, and rapid thermal annealing on the optical emission from a multi-layer quantum wire structure

Abstract

Multi-layer InAs quantum wire stacks with different layer separations (8, 15, and 25 nm) and InAs thicknesses (3, 4, 5, and 7 monolayers [ML]) were grown on and embedded in In0.53Ga0.27Al0.20As barrier/spacer layers lattice-matched to an InP substrate. For the samples with 4 ML of InAs and different layer separations, double peak photoluminescence was observed from quantum wire stacks separated by 8 nm, and with a 15 nm spacer layer a long …

Authors

Cui K; Robinson BJ; Thompson DA; Botton GA

Journal

Journal of Applied Physics, Vol. 109, No. 12,

Publisher

AIP Publishing

Publication Date

June 15, 2011

DOI

10.1063/1.3598082

ISSN

0021-8979