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Technique for mapping the spectral uniformity of...
Journal article

Technique for mapping the spectral uniformity of luminescent semiconducting material.

Abstract

A technique to map the spectral uniformity of luminescent semiconducting materials at room temperature is described. This technique is based on spatially resolved and polarization-resolved measurements of the photoluminescence and requires a polarizing beam splitter with a splitting ratio that has a linear dependence on wavelength. Measurements on a quantum-well sample that was patterned by intermixing with a focused ion beam are used to demonstrate the technique. With a spectral resolution of better than 1 nm and a spatial resolution of ≊1 µm, as well as the ability to map concurrently the strain field through the measurement of the degree of polarization of the photoluminescence and the photoluminescence yield, this technique provides a simple, nondestructive method of assessing luminescent materials.

Authors

Yang J; Cassidy DT

Journal

Applied Optics, Vol. 34, No. 22, pp. 4794–4799

Publisher

Optica Publishing Group

Publication Date

August 1, 1995

DOI

10.1364/ao.34.004794

ISSN

1559-128X

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