Home
Scholarly Works
The applied materials xRLEAP ion implanter for...
Conference

The applied materials xRLEAP ion implanter for ultra shallow junction formation

Authors

England J; Joyce L; Burgess C; Moffatt S; Foad M; Armour D; Current M

Editors

Ishidida E; Current M; Banerjee S; Larson L; Mehta S; Tasch A; Smith TC; Romig T

Pagination

pp. 470-473

Publisher

I E E E

Publication Date

January 1, 1997

ISBN-10

0-7803-3289-X

Name of conference

11th International Conference on Ion Implantation Technology

Conference place

TX, AUSTIN

Conference start date

June 16, 1996

Conference end date

June 21, 1996

Conference proceedings

ION IMPLANTATION TECHNOLOGY - 96

Contact the Experts team