Conference
Automatically high accurate and efficient photomask defects management solution for advanced lithography manufacture
Authors
Zhu J; Chen L; Ma L; Li D; Jiang W; Pan L; Shen H; Jia H; Hsiang C; Cheng G
Volume
9050
Publisher
SPIE, the international society for optics and photonics
Publication Date
April 2, 2014
DOI
10.1117/12.2042800
Name of conference
Metrology, Inspection, and Process Control for Microlithography XXVIII
Conference proceedings
Proceedings of SPIE--the International Society for Optical Engineering
ISSN
0277-786X