Conference
A new tool for nondestructive monitoring of ion implantation
Abstract
We describe recent research designed to assess the potential of charged particle beams as an implant-monitoring tool. The technique currently under development, based on positron annihilation spectroscopy, is totally nondestructive, sensitive to implant doses as low as 10/sup 9/ cm/sup -2/, and most importantly, can be tuned to obtain depth-resolved information. A collaborative project between the Surrey Ion Beam Centre and researchers at the …
Authors
Coleman PG; Burrows CP; Knights AP; Gwilliam RM; Sealy BJ; Goldberg RD; Al-Bayati A; Foad M; Murrell A
Pagination
pp. 654-657
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Publication Date
January 1, 2000
DOI
10.1109/iit.2000.924238
Name of conference
2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432)