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Metalorganic chemical-vapor deposition of...
Preprint

Metalorganic chemical-vapor deposition of high-reflectance III-nitride distributed Bragg reflectors on Si substrates

Abstract

High-reflectance group III-nitride distributed Bragg reflectors (DBRs) were deposited by MOCVD on Si (111) substrates. A reflectance greater than 96% was

Authors

Mastro MA; Holm RT; Bassim ND; Gaskill DK; Culbertson JC; Fatemi M; Eddy CR; Henry RL; Twigg ME

Publication date

September 2, 2020

DOI

10.48550/arxiv.2009.01207

Preprint server

arXiv