Journal article
The Effects of Deposition Parameters and Annealing Treatments on the Structure of Si-Rich Silicon Nitride and Oxynitride Thin Films
Authors
Roschuk T; Wojcik J; Zalloum O; Mascher P
Journal
ECS Meeting Abstracts, Vol. MA2007-02, No. 21, pp. 1176–1176
Publisher
The Electrochemical Society
Publication Date
September 28, 2007
DOI
10.1149/ma2007-02/21/1176
ISSN
2151-2043