Electron Beam Induced Crystallisation in Iron (III) Fluoride

Metal fluorides are excellent candidates as high resolution inorganic resists in electron beam nanolithography. Hence it is important to study their damage characteristics under the electron beam to understand their behaviour as inorganic resists. In this paper the electron beam induced damage process in amorphous FeF3 films deposited by different techniques is investigated using selected area diffraction patterns and time resolved parallel …