Journal article
Helium ion beam lithography and liftoff
Abstract
We introduce a helium ion beam lithography and liftoff process to fabricate arbitrary nanostructures. Exploiting existing high-resolution positive tone resists such as poly (methyl methacrylate) (PMMA), the process offers three significant advantages over electron beam lithography: (a) the exposing helium ion beam produces a high secondary electron yield leading to fast patterning, (b) proximity effects are negligible due to the low count of …
Authors
Rashid S; Walia J; Northfield H; Hahn C; Olivieri A; Lesina AC; Variola F; Weck A; Ramunno L; Berini P
Journal
Nano Futures, Vol. 5, No. 2,
Publisher
IOP Publishing
Publication Date
June 1, 2021
DOI
10.1088/2399-1984/abfd98
ISSN
2399-1984