Chapter
Pattern Formation during CW Laser Melting of Silicon
Abstract
We summarize our recent experimental and theoretical work on the molten-solid morphologies which form during irradiation of thin Si films by a cw, ⋋ = 10.6µm laser. We have observed a variety of ordered and disordered patterns which depend on laser intensity, spot size, polarization and angle of incidence.
Authors
Dworschak K; Preston JS; Sipe JE; Van Driel HM
Book title
Patterns, Defects and Materials Instabilities
Pagination
pp. 331-346
Publisher
Springer Nature
Publication Date
1990
DOI
10.1007/978-94-009-0593-1_22