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Ultraviolet-assisted pulsed laser deposition: a...
Journal article

Ultraviolet-assisted pulsed laser deposition: a new technique for the growth of thin oxide films at medium and low temperatures

Authors

Craciun V; Craciun D; Howard JM; Bassim ND; Singh RK

Journal

Proceedings of SPIE--the International Society for Optical Engineering, Vol. 4430, , pp. 205–214

Publisher

SPIE, the international society for optics and photonics

Publication Date

June 29, 2001

DOI

10.1117/12.432842

ISSN

0277-786X
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