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Electrical properties of Si-XII and Si-III formed...
Conference

Electrical properties of Si-XII and Si-III formed by nanoindentation

Abstract

Conventional silicon devices and integrated circuits are fabricated in the diamond cubic phase of silicon, socalled Si-l. Other phases of silicon can be formed under pressure applied by indentation and these phases are metastable at room-temperature and pressure. As we demonstrate, such phases behave entirely differently to normal diamond-cubic silicon (Si-l) having different electrical properties. Two such phases, Si-Xll (8C8) and Si-XII (R8), …

Authors

Wang Y; Ruffell S; Sears K; Knights AP; Bradby JE; Williams JS

Volume

1

Pagination

pp. 105-106

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Publication Date

December 1, 2010

DOI

10.1109/commad.2010.5699682

Name of conference

2010 Conference on Optoelectronic and Microelectronic Materials and Devices