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Effect of the forward biasing the source-substrate...
Conference

Effect of the forward biasing the source-substrate junction in n-metal–oxide–semiconductor transistors for possible low power complementary metal–oxide–semiconductor integrated circuits’ applications

Abstract

The use of forward biasing the source-substrate junction in metal–oxide–semiconductor transistors, to reduce its threshold voltage is a simple method to realize low power complementary metal–oxide–semiconductor integrated circuits. A 2 μm long n-metal–oxide–semiconductor field effect transistor was used as the device under test. The threshold voltage was measured in the temperature range of 300–77 K, using two different methods. The classic …

Authors

De la Hidalga-W. FJ; Deen MJ; Gutierrez-D. EA; Balestra F

Volume

16

Pagination

pp. 1812-1817

Publisher

American Vacuum Society

Publication Date

July 1, 1998

DOI

10.1116/1.590092

Conference proceedings

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

Issue

4

ISSN

2166-2746