Conference
Effect of the forward biasing the source-substrate junction in n-metal–oxide–semiconductor transistors for possible low power complementary metal–oxide–semiconductor integrated circuits’ applications
Abstract
The use of forward biasing the source-substrate junction in metal–oxide–semiconductor transistors, to reduce its threshold voltage is a simple method to realize low power complementary metal–oxide–semiconductor integrated circuits. A 2 μm long n-metal–oxide–semiconductor field effect transistor was used as the device under test. The threshold voltage was measured in the temperature range of 300–77 K, using two different methods. The classic …
Authors
De la Hidalga-W. FJ; Deen MJ; Gutierrez-D. EA; Balestra F
Volume
16
Pagination
pp. 1812-1817
Publisher
American Vacuum Society
Publication Date
July 1, 1998
DOI
10.1116/1.590092
Conference proceedings
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
Issue
4
ISSN
2166-2746