Electrodeposition of chitosan–hemoglobin films

Electrochemical method has been developed for the fabrication of chitosan–hemoglobin films. The proposed deposition mechanism involved pH changes at the electrode surface attributed to electrochemical reactions, electrophoretic motion of cationic chitosan and hemoglobin macromolecules, coagulation and film formation at the electrode surface. The results of deposition yield measurements, and Fourier transform infrared spectroscopy and circular dichroism spectroscopy studies showed the formation of composite films containing hemoglobin in a chitosan matrix. Electron microscopy studies showed that the film thickness can be varied in the range of 0–2μm by the variation of deposition time at a constant deposition voltage. The films were investigated for applications in biosensors.