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Quantum-well strain and thickness characterization...
Journal article

Quantum-well strain and thickness characterization by degree of polarization

Abstract

InGaAsP/InP single quantum wells grown by gas-source molecular-beam epitaxy have been characterized for their strain and thickness using degree of polarization (DOP) of the edge emission photoluminescence at room temperature. The DOP is a measure of the relative strengths of TE- and TM-polarized e–hh and e–lh transitions. The value of the DOP increases with a decrease in thickness of the well and as the strain varies from tension to …

Authors

Lakshmi B; Cassidy DT; Robinson BJ

Journal

Journal of Applied Physics, Vol. 79, No. 10, pp. 7640–7645

Publisher

AIP Publishing

Publication Date

May 15, 1996

DOI

10.1063/1.362427

ISSN

0021-8979