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Journal article

High-resolution transmission electron microscopy investigation of a stacking fault in β-Si3N4

Abstract

High-resolution transmission electron microscopy images of stacking faults on (0 0 1) and (1 0 1) planes in a β-Si3N4 whisker were obtained and compared to image simulations. This procedure showed that the atomic structure of the four atomic planes around the (0 0 1) stacking fault plane in the β-phase is very similar to that of the unit cell of α-Si3N4 crystal. The stacking fault was observed to climb under electron irradiation in the microscope.

Authors

NING XG; WILKINSON DS; WEATHERLY GC; YE HQ

Journal

Journal of Materials Science, Vol. 32, No. 6, pp. 1431–1436

Publisher

Springer Nature

Publication Date

January 1, 1997

DOI

10.1023/a:1018541631100

ISSN

0022-2461

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