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Polarization dependence of the Si K-edge X-ray...
Journal article

Polarization dependence of the Si K-edge X-ray absorption spectra of Si-Ge atomic layer superlattices

Abstract

The polarization dependence of the Si K-edge X-ray absorption spectra of several [(Si)m(Ge)n]p atomic layer superlattice (ALS) materials grown on both Si(100) and Ge(100) have been investigated using plane polarized synchrotron radiation. These spectra exhibit sharp, polarization dependent, Si ls → conduction band (CB) resonance features which are absent in the spectrum of amorphous Si (a-Si). Subtraction of the spectrum of a-Si from that of …

Authors

Hitchcock AP; Tyliszczak T; Aebi P; Feng XH; Lu ZH; Baribeau J-M; Jackman TE

Journal

Surface Science, Vol. 301, No. 1-3, pp. 260–272

Publisher

Elsevier

Publication Date

January 1994

DOI

10.1016/0039-6028(94)91306-4

ISSN

0039-6028