Conference
X-ray absorption studies of strain in epitaxial (Si-Ge) atomic layer superlattice and alloy films
Abstract
The Si 1s (K-shell) X-ray absorption spectra of a series of strained Si(x)Ge(100-x) alloy thin films and several {(Si)(m)(Ge)(n)}(p) atomic layer superlattices (ALS) grown epitaxially on Si(100) and Ge(100) substrates have been investigated using plane polarized synchrotron radiation. Polarization dependent components of the signal are attributed to anisotropic states associated with strain-induced tetragonal distortions. The sense of the …
Authors
Tyliszczak T; Hitchcock AP; Lu ZH; Baribeau JM; Jackman TE; McComb D
Volume
8
Pagination
pp. 795-802
Publication Date
December 1, 1994
Conference proceedings
Scanning Microscopy
Issue
4
ISSN
0891-7035