Conference
Volatile products and endpoint detection in reactive ion etching of III-V compounds with a broad beam ECR source (Reprinted from Nuclear Instruments and Methods in Physics Research B, vol 106, pg 179-182, 1995)
Authors
Melville DL; Budinavicius J; Thompson DA; Simmons JG
Editors
Williams JS; Elliman RG; Ridgway MC
Pagination
pp. 179-182
Publisher
ELSEVIER SCIENCE PUBL B V
Publication Date
January 1, 1996
ISBN-10
0-444-82334-4
Name of conference
9th International Conference on Ion Beam Modification of Materials (IBMM 95)
Conference place
AUSTR NATL UNIV, CANBERRA, AUSTRALIA
Conference start date
February 5, 1995
Conference end date
February 10, 1995
Conference proceedings
ION BEAM MODIFICATION OF MATERIALS