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The Effects of InP Grown by He-Plasma Assisted...
Journal article

The Effects of InP Grown by He-Plasma Assisted Epitaxy on Quantum-Well Intermixing

Abstract

He-plasma assisted InP (He*-InP) layers grown by gas source molecular beam epitaxy (GSMBE) have been employed to enhance quantum well (QW) intermixing induced by rapid thermal annealing in a 1.5-µm InGaAsP QW laser structure. Inserting a 40-nm He*-InP layer just above the active region enhances the blue-shift for anneal temperatures larger than 680 ºC, and a 42-nm additional blue-shift is obtained at 750 ºC for samples with the He*-InP layer, …

Authors

Yin T; Letal GJ; Robinson BJ; Thompson DA

Journal

IEEE Journal of Quantum Electronics, Vol. 37, No. 3, pp. 426–429

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Publication Date

March 2001

DOI

10.1109/3.910453

ISSN

0018-9197