Investigation of a Dielectric Modulated Dual Metal Gate Engineered SOI FinFET with High-K Dielectric for Bio-sensitivity Enhancement

This paper presents a novel biosensor design featuring a dielectric-modulated, dual metal gate SOI FinFET with high-K dielectric materials. A nano-cavity formed under the gate between an SiO2 spacer and Hf02 high-K oxide accommodates biomolecules with various dielectric constants (K). The effects on drain current and energy band diagrams are analyzed for neutral and charged biomolecules, showing maximum sensitivity at K=12. The proposed biosensor demonstrates superior sensitivity compared to existing state-of-the-art biosensors, offering significant potential for its application in healthcare and biotechnology.