TruNano™ processing of color photoresist for the flexible LCD module

We present a low temperature thermal process for the color photoresist on the flexible substrate for the LCD color filter module by the TruNano™ processor in combination with a compositional modification to the conventional color photoresist. By this method the curing temperature can be lowered by more than 100°C, and the curing process time also can be shortening by more than 20 min.