Journal article
Plasma Focused Ion Beam Curtaining Artifact Correction by Fourier-Based Linear Opti-mization Model
Authors
Schankula CW; Anand CK; Bassim ND
Journal
Microscopy and Microanalysis, Vol. 24, No. S1, pp. 588–589
Publisher
Oxford University Press (OUP)
Publication Date
August 2018
DOI
10.1017/s1431927618003434
ISSN
1431-9276