Conference
UV Laser Resist-Mask Writing for Low-Cost Prototyping of Integrated Optical Devices
Abstract
We report on UV-laser photoresist-mask writing as a tool for fabricating integrated optical waveguides. We investigate feature width and roughness under different write settings and apply the technique to realize integrated Si3 N4 waveguides and devices.
Authors
Bonneville DB; Mendez-Rosales MA; Frankis HC; Bradley JDB
Publication Date
May 1, 2019
DOI
10.23919/CLEO.2019.8750407
Conference proceedings
2019 Conference on Lasers and Electro Optics CLEO 2019 Proceedings